Target material structure of sputter coating

The utility model discloses a target material structure of a sputter coating. The target material comprises a flat plate target material, wherein the bottom of the target material is provided with a plurality of rows of columnar magnets, adjacent rows of magnets have different polarities, inclined s...

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Bibliographische Detailangaben
Hauptverfasser:	YAN DULUN, WANG KEBIN, TANG GUIMIN, WU XIBIAO, WANG MINJIE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The utility model discloses a target material structure of a sputter coating. The target material comprises a flat plate target material, wherein the bottom of the target material is provided with a plurality of rows of columnar magnets, adjacent rows of magnets have different polarities, inclined surfaces towards the middle are arranged on the top surfaces of the magnets located at both sides and inclined surfaces towards both sides are respectively arranged at both sides of the top of the intermediate magnets. The target material structure has the beneficial effects that since the magnets are made into pole shoes by adjusting the inclination degree of the surfaces of the magnets, the number of the magnetic lines of force parallel to the surface of target is effectively increased and the utilization rate of the target material is improved, the one-time investment is small and the change of other hard devices and the adjustment on the production process do not be needed.