Magnetron sputtering etching equipment with positive electrode shell

The utility model relates to magnetron sputtering etching equipment with a positive electrode shell. The utility model relates to equipment for etching by virtue of a sputtering technology, and particularly relates to the positive electrode shell in the structure, which can prevent plasma from leaving the shell caused by etching. The equipment is suitable for pre-treatment on a substrate of a metal band in vacuum, thereby presenting a facility. Aiming at overcoming the defects in the prior art, the utility model aims to provide magnetron sputtering etching equipment which inhibits burn-off of the plasma. The equipment provided by the utility model is characterized in that at least part of a dark shield (1) can move, so that the substrate distance (8) can be adjusted.