Magnetron sputtering anti-short-circuiting pressing block for rectangular plane target

The utility model discloses a magnetron sputtering anti-short-circuiting pressing block for a rectangular plane target. The magnetron sputtering anti-short-circuiting pressing block comprises a pressing block main body, wherein a mounting hole is formed in the pressing block main body. The magnetron...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NIAN ZHIGANG, LIU ZHIBIAO, DU FU, JIANG XINBO, LAI SHANCHUN, ZHOU JIAN, BAO LIQIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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