Device for preparing micro-nano structure thin film by utilizing ion beam sputtering method

The utility model provides a device for preparing a micro-nano structure thin film by utilizing an ion beam sputtering method. The device comprises an ion beam sputtering device and a collimating and filtering device, wherein the collimating and filtering device is connected with a sample frame of the ion beam sputtering device; and the collimating and filtering device comprises a disk, a plurality of filter screens and a plurality of circular rings, wherein the lower surface of the disk is connected with the sample frame, all the circular rings are sequentially overlapped on the upper surface of the disk, and the filter screens are arranged among all the circular rings. The device provided by the utility model can effectively improve the quality of the micro-nano structure thin film and has important application values in the field of nano-integrated circuits.