Novel ion beam compound treatment system

The utility model discloses an ion beam compound treatment system which comprises a vacuum chamber, a mixed ion beam injection device, a magnetron sputtering target and an ion sputtering source. The system provided by the utility model, which combines the magnetron sputtering and ion injection techn...

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Hauptverfasser: ZENG YONGYUAN, XIE ZHAOJUE, ZHOU HONGYU
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Sprache:chi ; eng
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creator ZENG YONGYUAN
XIE ZHAOJUE
ZHOU HONGYU
description The utility model discloses an ion beam compound treatment system which comprises a vacuum chamber, a mixed ion beam injection device, a magnetron sputtering target and an ion sputtering source. The system provided by the utility model, which combines the magnetron sputtering and ion injection technologies, has the function of gas ion injection, metal ion injection and compound ion injection, so that the system is suitable for surface modification of metal materials, optical films, conductive films, semiconductor materials and the like, and has higher practical value.
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language chi ; eng
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Novel ion beam compound treatment system
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