Novel ion beam compound treatment system

The utility model discloses an ion beam compound treatment system which comprises a vacuum chamber, a mixed ion beam injection device, a magnetron sputtering target and an ion sputtering source. The system provided by the utility model, which combines the magnetron sputtering and ion injection techn...

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Bibliographische Detailangaben
Hauptverfasser:	ZENG YONGYUAN, XIE ZHAOJUE, ZHOU HONGYU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The utility model discloses an ion beam compound treatment system which comprises a vacuum chamber, a mixed ion beam injection device, a magnetron sputtering target and an ion sputtering source. The system provided by the utility model, which combines the magnetron sputtering and ion injection technologies, has the function of gas ion injection, metal ion injection and compound ion injection, so that the system is suitable for surface modification of metal materials, optical films, conductive films, semiconductor materials and the like, and has higher practical value.