Illuminating system, pattern illuminating system and pattern projection system

The utility model discloses an illuminating system, a pattern illuminating system and a pattern projection system. The illuminating system comprises a light source, a light restraint element and a homogenization element, wherein the light restraint element is disposed at the downstream of the light...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	YANG LONGSHAN, SU ZHILIN, ZENG SIXIONG, SHEN WEIHUANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM BLASTING CINEMATOGRAPHY ELECTROGRAPHY FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMSTHEREOF HEATING HOLOGRAPHY LIGHTING MECHANICAL ENGINEERING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHOTOGRAPHY PHYSICS STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHERARTICLES, NOT OTHERWISE PROVIDED FOR WEAPONS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The utility model discloses an illuminating system, a pattern illuminating system and a pattern projection system. The illuminating system comprises a light source, a light restraint element and a homogenization element, wherein the light restraint element is disposed at the downstream of the light source, and restrains the exit angle of light emitted by the light source within a preset range, and the homogenization element is disposed at the downstream of the light source, receives light emitted by the light restraint element and emits the received light to enable the distribution of the light to be uniform. The pattern illuminating system comprises the illuminating system mentioned above and a pattern plate, wherein the pattern plate forms a pattern with an inhomogeneous transmissivity, is disposed at the downstream of the homogenization element, and receives light emitted by the homogenization element. The pattern projection system comprises the pattern illuminating system mentioned above and an imaging sy