Vacuum film plating machine capable of adjusting vacuum degree

The utility model discloses a vacuum film plating machine capable of adjusting vacuum degree. The vacuum film plating machine comprises a vacuum chamber body and a low-temperature pump. The vacuum film plating machine is characterized by further comprising a gate valve with adjustable opening degree...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LIU LIMING, TIAN JUNJIE, ZHAO SHANQUAN, DENG FENGLIN, CHEN HONGFEI, ZHENG DONG, JIANG WEIJIN, GUAN YONGQING, WANG WENZHONG, CHEN JUN, HONG JING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The utility model discloses a vacuum film plating machine capable of adjusting vacuum degree. The vacuum film plating machine comprises a vacuum chamber body and a low-temperature pump. The vacuum film plating machine is characterized by further comprising a gate valve with adjustable opening degree; the gate valve comprises a valve body and a valve plate which are connected in a sealing way; and one end of the valve body is fixedly connected with the vacuum chamber body while the other end of the valve body is fixedly connected with the cold end of the low-temperature pump. With the adoption of the vacuum film plating machine capable of adjusting the vacuum degree disclosed by the utility model, the vacuum degree of the vacuum chamber body can be controlled to a certain scope, and working efficiency is ensured, and no influence is brought to a usage cycle of the low-temperature pump.