Rapid heat dissipation and dust removal device for plate PECVD discharge position

The utility model discloses a rapid heat dissipation and dust removal device for a plate PECVD discharge position. Fans are mounted on the buffer platform of the discharge position to blow air to a coated silicon wafer, so as to rapidly dissipate heat and remove silicon nitride dust on the upper surface of the silicon wafer. In the rapid heat dissipation and dust removal device disclosed by the utility model, the fans are mounted on the buffer platform of the discharge position to blow air to the coated silicon wafer, so as to rapidly dissipate heat and remove silicon nitride dust on the upper surface of the silicon wafer, and the number of fans and the horizontal direction of fans in each group are corresponding one by one to those of the silicon wafers carried by a graphite frame, to realize uniform and sufficient heat dissipation and complete dust removal; and the fans form an angle of about 30 degrees with the buffer platform, to completely remove dust.