Gas release buffering pipeline for vacuum cavities of vacuum film plating machines
The utility model discloses a gas release buffering pipeline for vacuum cavities of vacuum film plating machines, which comprises a connecting port, a cavity and a gas release buffering pipe, wherein a first gas vent for ventilation is arranged on the cavity, a second gas vent is arranged on the gas...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses a gas release buffering pipeline for vacuum cavities of vacuum film plating machines, which comprises a connecting port, a cavity and a gas release buffering pipe, wherein a first gas vent for ventilation is arranged on the cavity, a second gas vent is arranged on the gas release buffering pipe, one end of the connecting port is connected with the first gas vent, and the other end is connected with the second gas vent. Accordingly, gases in the cavity are accelerated to be discharged, and gas releasing time of the cavity is effectively reduced by connecting the connecting port between the cavity and a gas release buffering tank to communicate gases in the cavity with the gas release buffering pipe. As film can be effectively prevented from falling off substrates during the film plating, plating product qualification yield is improved, besides, the structure is simple, mounting is convenient, the plating product is not easy to loosen after fastened, and work stability is good. |
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