Pulse deposition method for nano crystalline chromium plating layer using trivalent chromium
The invention discloses a sedimenting method of nanometer crystal chrome plating layer through trivalent chrome system pulse, which is characterized by the following: predisposing plating piece; proceeding electric deposition; improving current efficiency of plating liquid system to 25. 32%; possess...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention discloses a sedimenting method of nanometer crystal chrome plating layer through trivalent chrome system pulse, which is characterized by the following: predisposing plating piece; proceeding electric deposition; improving current efficiency of plating liquid system to 25. 32%; possessing chrome content of the plating liquid as one seventh as plating liquid of chromic acid. |
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