Display device and manufacturing method thereof
The present invention relates to a display device and a manufacturing method thereof wherein characteristics of a TFT can be enhanced. The manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The present invention relates to a display device and a manufacturing method thereof wherein characteristics of a TFT can be enhanced. The manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening. |
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