Composition for removing a (photo)resist

Bibliographische Detailangaben

1. Verfasser:	KIM BYUNG-UK,YOON SUK-IL,KIM SEONG-BAE,KIM WY-YONG,JANG SUKANG,JEONG JONG-HYUN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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