Method for detecting leakage of outer gas into vacuum chamber

A method for detecting inflow of the outside air of a vacuum chamber is provided to measure performance of outside air blocking during processing by performing a light detection of gas existed in the vacuum chamber. Process gas is charged into a vacuum chamber(S10). Gas existed in the vacuum chamber...

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Bibliographische Detailangaben
1. Verfasser:	PARK GI-RYANG,GANG HYEON-GRU,CHOE MYEONG-SOO,SANGTAE-JOON
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	A method for detecting inflow of the outside air of a vacuum chamber is provided to measure performance of outside air blocking during processing by performing a light detection of gas existed in the vacuum chamber. Process gas is charged into a vacuum chamber(S10). Gas existed in the vacuum chamber is light-detected to measure intensity of a wavelength where the process gas and the outside air are included(S20,S30). A ratio of the outside air to the process gas is calculated based on the measured intensity of the wavelength(S40). Background level intensity of each wavelength where the process gas and the outside air are included is calculated by measuring intensity of a neighboring wavelength. Net wavelength intensity of each wavelength where the process gas and the outside air are included is calculated by subtracting the background level intensity therefrom. When the ratio is greater than a limited value, an alarm is sent out(S50,S60).