Substrate processing equipment, substrate processing method, recording medium and software

Substrate processing equipment (1) is provided with a treatment tank (3) for treating a substrate with a treatment liquid, a dry process part (6) arranged at an upper part of the treatment tank (3), and a transfer mechanism (8) for transferring the substrate (W) between the treatment tank (3) and the dry process part (6). A process gas supplying line (21) for supplying a process gas and inert gas supplying lines (24, 25) for supplying the dry process part (6) with an inert gas are connected to the dry process part (6). A first exhaust line (26) for exhausting an atmosphere pushed out from the dry process part (6) and a second exhaust line (27) for forcibly exhausting the dry process part (6) are connected to the dry process part (6).