Semiconductor device

When an interlayer film ( 22 ) is formed to have a large thickness and an electrode pad ( 11 ) is partly or wholly led out from an active region ( 16 ), an I/O region ( 15 ) can be reduced in area. Thus, it is possible to reduce an area of a semiconductor device.

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: NAGAI NORIYUKI,HAMATANI TSUYOSHI,MIMURA TADAAKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:When an interlayer film ( 22 ) is formed to have a large thickness and an electrode pad ( 11 ) is partly or wholly led out from an active region ( 16 ), an I/O region ( 15 ) can be reduced in area. Thus, it is possible to reduce an area of a semiconductor device.