Photosensitive resin composition

This invention provides a photosensitive resin composition and in particular, it provides a photosensitive resin composition comprising (a) an acryl-based copolymer obtained by copolymerizing (i) an unsaturated carbonic acid, unsaturated carbonic anhydride or mixture thereof, (ii) a hydroxy group co...

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Bibliographische Detailangaben
1. Verfasser:	RYO TAE-HUN,KIM BYONG-UK,JIN HYEK-MIN,KOO KEE-HYEK,JIN CHOO-BO,CHEONG EUIOL,KIM DONG-MIN,CHOE SANG-GYO,LEE HAOIN,SHIN HONG-DAE,LEE DONG-HYEK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	This invention provides a photosensitive resin composition and in particular, it provides a photosensitive resin composition comprising (a) an acryl-based copolymer obtained by copolymerizing (i) an unsaturated carbonic acid, unsaturated carbonic anhydride or mixture thereof, (ii) a hydroxy group containing olefin-based unsaturated compound, and (iii) an olefin-based unsaturated compound and then eliminating unreacted monomers; (b) a 1,2-quinonediazide compound; (c) an epoxy-based compound represented by any one of formula 1 to 6; and (d) a solvent.