Exhaust gas treating method for semiconductor and photoelectric process
The method of treating tail gas from semiconductor and photoelectronic production process includes activating water into plasma state, and utilizing the plasma with high temperature and free radicals of H and O to react and destroy toxic waste gas and contained halide to form low toxicity or no toxi...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The method of treating tail gas from semiconductor and photoelectronic production process includes activating water into plasma state, and utilizing the plasma with high temperature and free radicals of H and O to react and destroy toxic waste gas and contained halide to form low toxicity or no toxicity gas. The method has short waste gas treating time and low cost. |
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