Method, program product and apparatus for optimizing illumination for full-chip layer

Optimisation of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined (10) so as to generate a pitch frequency histogram (12) of the full- chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch freq...

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Bibliographische Detailangaben
1. Verfasser:	SOCHA ROBERT J.,CHEN JANG F
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Optimisation of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined (10) so as to generate a pitch frequency histogram (12) of the full- chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient (16). An integral equation for the first eigenfunction of the transformation cross coefficient is solved (18) so as to define the optimal illumination for imaging the full-chip layer (20).