Chemical vaporization-coating device

A chemical vapor deposition apparatus is provided to uniformly form deposition layers by increasing a flow length of each nozzle hole in a nozzle unit progressively from a center axis line to an outside of a semi-diameter direction of the nozzle hole. A reactor(30) comprises a reactive chamber(31) h...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	KUL GWANG JOON,ANDRIY YUSHAKOV,WU CHENGTAI,CHEONGGYONG SACK,CHEONG HWA CHUN
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY NOZZLES PERFORMING OPERATIONS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A chemical vapor deposition apparatus is provided to uniformly form deposition layers by increasing a flow length of each nozzle hole in a nozzle unit progressively from a center axis line to an outside of a semi-diameter direction of the nozzle hole. A reactor(30) comprises a reactive chamber(31) having a gas inlet hole(33). A reactive gas is supplied to an upper portion of the gas inlet hole. A support(70) supports a target in the reactive chamber. A shower head(40) sprays the reactive gas to the target from the gas inlet hole. The shower head has a nozzle unit(50) where plural nozzle holes(51) are formed. A flow length of a center axis line of the nozzle hole is shorter than an outside of a semi-diameter direction thereof. Outlet ends(55) of the nozzle holes are uniformly separated from the support. Inlet ends(53) of the nozzle holes at the outside of the semi-diameter direction are farther from the support than the center axis line thereof.