Method for photo-embossing a monomer-containing layer

The invention relates to a method for photo-embossing a monomer-containing layer for obtaining a photovoltaic cell, a light emitting diode (LED), or a light emitting electrochemical cell (LEC) by the steps of: (a) optionally providing one or more layers onto the surface of the monomer-containing lay...

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Bibliographische Detailangaben
1. Verfasser:	KURT RALPH,DE KOK-VAN BREEMEN MARGARETHA,BECHTEL HANS-HELMUT,SETAYESH SEPAS,BROER DIRK J.,JAK MARTIN J. J
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention relates to a method for photo-embossing a monomer-containing layer for obtaining a photovoltaic cell, a light emitting diode (LED), or a light emitting electrochemical cell (LEC) by the steps of: (a) optionally providing one or more layers onto the surface of the monomer-containing layer, (b) irradiating through a mask a layer consisting of a homogeneous blend of at least two different compounds, at least one of which is a polymerizable monomer, to obtain a monomer-containing layer with exposed and non-exposed areas; (c) optionally providing further layers onto the surface of the monomer-containing layer; (d) expanding the exposed or the non-exposed areas by diffusing at least one of the monomers to the exposed areas to obtain a corrugated surface of the layer; or interchanging steps c) and d).