Positive photoresist and method for producing structure

Disclosed is a positive photoresist which can be developed with a low-concentration aqueous alkaline solution or neutral water and can be easily removed by ozone water. The positive photoresist hardly leave scum and enables to reduce cost and environmental damages. Also disclosed is a method for pro...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NAKAMURA MASANORI,MORI NOBUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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