Device and method for patterning structures on a substrate

A device for patterning structures on a substrate comprising an imaging device having a scanning tip a light emitting device, and a space around the scanning tip, which space comprises a vapour of a material which is suitable for Chemical Vapour Deposition onto the substrate when decomposed, wherein...

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1. Verfasser: KARG SIEGFRIED F.,RIEL HEIKE E.,RIESS WALTER,SCHLITTLER RETO,GERMANN ROLAND W
Format: Patent
Sprache:eng
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Zusammenfassung:A device for patterning structures on a substrate comprising an imaging device having a scanning tip a light emitting device, and a space around the scanning tip, which space comprises a vapour of a material which is suitable for Chemical Vapour Deposition onto the substrate when decomposed, wherein the light emitting device is adapted to emit a light beam, which light beam has an intensity that is not capable to decompose the vapour, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapour.