Imprint lithography templates having alignment marks

One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.

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Bibliographische Detailangaben
1. Verfasser:	BAILEY TODD C.,JOHNSON STEPHEN C.,COLBURN MATTHEWE.,CHOI BYUNG J.,SMITH BRITAIN J.,EKERDT JOHN G.,WILLSON CARLTON G.,SREENIVASAN SIDLGATA V
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.