Plasma exciting method

The invention is related to method for energizing plasma. When energizing plasma, the method uses different electric signals to input to up and low electrodes respectively in order to energize plasma. Advantages are: reducing asymmetry of azimuth angle, improving evenness of plasma so as to reduce d...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	QIAOLI SONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention is related to method for energizing plasma. When energizing plasma, the method uses different electric signals to input to up and low electrodes respectively in order to energize plasma. Advantages are: reducing asymmetry of azimuth angle, improving evenness of plasma so as to reduce difference of chemical reaction speed occurred in surface of chip, reach even etching rate, reduce trouble of plasma. Thus, the invention raises quality of etched chip.