Method for preparing photosensitive aqueous developable coating composition

A method for preparing a photosensitive aqueous developable coating composition is disclosed. The method does not involve a step of drying, pulverizing, and re-dissolving a solid polymer when preparing the coating composition. In addition, dilution of a polymerization solution by a solvent and a sep...

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Bibliographische Detailangaben
1. Verfasser:	MOON JEONG KI,KIM YEONG SEOK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for preparing a photosensitive aqueous developable coating composition is disclosed. The method does not involve a step of drying, pulverizing, and re-dissolving a solid polymer when preparing the coating composition. In addition, dilution of a polymerization solution by a solvent and a separate process for adjusting the viscosity of the polymerization solution are not needed. Therefore, the process for preparing the compositions can be simplified and undercut problems of a patterned edge during development and subsequent edge curl problems after a firing process can be overcome.