Vacuum processor

The context discloses a vacuum treatment device which is used on a substrate for etching treatment or spray plating, for example, the use on the glass piece of a liquid crystal display (LCD) panel, on a semiconductor chip, etc. The vacuum treatment device includes an upper cover and a lower cover wh...

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Bibliographische Detailangaben
1. Verfasser: CHOL HEUN,KIM YOUNGUN,AM HYUN-TACK,LEE SOO-SOUNG,HAN CHAE-PYEONG,CHO SAENG-HYEUN,CHEE DAE-GE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The context discloses a vacuum treatment device which is used on a substrate for etching treatment or spray plating, for example, the use on the glass piece of a liquid crystal display (LCD) panel, on a semiconductor chip, etc. The vacuum treatment device includes an upper cover and a lower cover which are interconnected. The clearance formed between the upper and the lower covers forms a vacuum treatment space which is sealed or unsealed by a cavity sealing unit through a sealing or unsealing clearance. The device also includes a clearance maintaining unit used for maintaining the clearance and arranged on the upper and the lower covers.