AI-Ni-rare earth element alloy sputtering target

An Al-base alloy sputtering target comprising Ni and one or more rare earth elements, wherein there are 5.0 × 10 4 /mm 2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2µm or larger, when a cross sectional surface perpendicular to the plane of the target is...

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Bibliographische Detailangaben
1. Verfasser:	KUGIMIYA TOSHIHIRO,TAKAGI KATSUTOSHI,MATSUZAKI HITOSHI,KITASHITA KOTARO,YONEDA YOICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	An Al-base alloy sputtering target comprising Ni and one or more rare earth elements, wherein there are 5.0 × 10 4 /mm 2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2µm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.