Inductive coupling coil and inductive coupling plasma apparatus thereof

This invented inductance couple coil is formed by an inner coil set connected with an outer coil set, one of which is composed of two parallel coils in different diameters in which, this kind of inductance couple plasma device reduces the inductance of the coil so as to get large areas of plasma and...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	QIAOLI SONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INDUCTANCES MAGNETS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SEMICONDUCTOR DEVICES TRANSFORMERS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	This invented inductance couple coil is formed by an inner coil set connected with an outer coil set, one of which is composed of two parallel coils in different diameters in which, this kind of inductance couple plasma device reduces the inductance of the coil so as to get large areas of plasma and improve its uniformity and the distribution of plasma becomes more uniform at radial and azimuth angle direction by connecting a ground condenser at the output end of the coil, further more, the design of inner and outer plane coils improves the distribution of plasma in the reaction chamber so that the etching rates at the points of the surface of the wafer get more close.