Polarized radiation in lithographic apparatus and device manufacturing method

A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	WAGNER CHRISTIAN,DE BOEIJ WILHELMUS P.,DE JONGE ROEL,HEIL TILMANN,FIOLKA DAMIAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.