Device and method for thermal treatment

This invention relates to a system and a method for the heat treatment of substrates, incorporating an annular heat-treatment section with a rotary table designed to accept substrate holders, at least two of which substrate holders are positioned one behind the other in heat-treatment zones that ext...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	EISENHAMMER THOMAS,MATT THOMAS,STRITTMATTER GEBHARD,ZAPF KLAUS
Format:	Patent
Sprache:	eng
Schlagworte:	BAKERS' OVENS BAKING BASIC ELECTRIC ELEMENTS BLASTING DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE EDIBLE DOUGHS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FURNACES HEATING HUMAN NECESSITIES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER KILNS LIGHTING MACHINES OR EQUIPMENT FOR BAKING MECHANICAL ENGINEERING OVENS PHYSICS RETORTS SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	This invention relates to a system and a method for the heat treatment of substrates, incorporating an annular heat-treatment section with a rotary table designed to accept substrate holders, at least two of which substrate holders are positioned one behind the other in heat-treatment zones that extend in a radial spoke pattern around the center of the rotary table.