Semiconductor device

A semiconductor device having a multi-layered wiring structure that prevents breakage and exfoliation of the inter-layer insulating films of the semiconductor device and realizes a high-speed, stable operation. In the semiconductor device, a wiring structure using insulating films of a high fracture...

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Bibliographische Detailangaben
1. Verfasser: FUKUYAMA TOSHIKAZU,YAMATO TABO,IGAMI HIROKO,SUGIMOTO KEN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device having a multi-layered wiring structure that prevents breakage and exfoliation of the inter-layer insulating films of the semiconductor device and realizes a high-speed, stable operation. In the semiconductor device, a wiring structure using insulating films of a high fracture toughness value is built in the multi-layered wiring structure, whereby the insulating films of the high fracture toughness value lessen the influence of the stress on the semiconductor device, thereby allowing the multi-layered wiring structure to prevent breakage and exfoliation of the inter-layer insulating films and realize the stable operation.