Lithographic apparatus and device manufacturing method
Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
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| creator | BASELMANS JOHANNES JACOBUS MAT,BRUINSMA ANASTASIUS JACOBUS AN,HERMAN DE JAGER PIETER W.,VINK HENRI JOHANNES PETRUS,BENSCHOP JOZEF PETRUS HENRICUS |
| description | Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots. |
| format | Patent |
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| language | eng |
| recordid | cdi_epo_espacenet_CN1766737A |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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