Lithographic apparatus and device manufacturing method

Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.

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Bibliographische Detailangaben
1. Verfasser:	BASELMANS JOHANNES JACOBUS MAT,BRUINSMA ANASTASIUS JACOBUS AN,HERMAN DE JAGER PIETER W.,VINK HENRI JOHANNES PETRUS,BENSCHOP JOZEF PETRUS HENRICUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.