Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a su...

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Bibliographische Detailangaben
Hauptverfasser:	QUAEDACKERS JOHANNES A, STAVENGA MARCO K, VERHAGEN MARTINUS C. M, HUBERTUS MUITJENS MARCEL J. E, DE JONG FREDERIK E, MOERMAN RICHARD, JANSSEN FRANCISCUS J. J, VAN DER NET ANTONIUS J, TINNEMANS PATRICIUS A. J, MENCHTCHIKOV BORIS, OTTENS JOOST J, JACOBS JOHANNES H. W, NIHTIANOV STOYAN, SCHOONDERMARK BART L. P, CADEE THEODORUS P. M, KATE NICOLAAS T, REUHMAN-HUISKEN MARIA E, DE MOL CHRISTIANUS G. M, LOOPSTRA ERIK R, BOOM HERMAN, MARIA MERTENS JEROEN J. S, GOORMAN KOEN, VERMEER ASCHWIN LODEWIJK HEND J, SMEETS MARTIN F. P, RIEPEN MICHEL, HENDRICUS VERSPAY JACOBUS JOHA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of said projection system and said substrate with liquid; a seal member arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements to control and/or compensate for evaporation of immersion liquid from said substrate.