Method for monitoring plasma etching platform after prevention and maintenance process

This invention provides a monitor method after the preventive maintenance technology for a plasma etching platform, which utilizes a goodness-of-fit analysis equation to carry out goodness-of-fit analysis to the actual curve and theoretical curve set by the plasma etching platform to evaluate if the...

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Bibliographische Detailangaben
1. Verfasser:	BINGYUN,CAO SUN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	This invention provides a monitor method after the preventive maintenance technology for a plasma etching platform, which utilizes a goodness-of-fit analysis equation to carry out goodness-of-fit analysis to the actual curve and theoretical curve set by the plasma etching platform to evaluate if the set values suit the needs of the technology after the preventive maintenance.