Suction nozzle for radiation etching apparatus
The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam...
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| creator | PEIJUAN YE YI ZHANG TONGSHENG ZHENG |
| description | The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam outlet and the debris channel is arranged independent of the radiation beam channel and has at least a debris suction inlet arranged near the radiation beam outlet. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN1642371A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN1642371A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN1642371A3</originalsourceid><addsrcrecordid>eNrjZNALLk0uyczPU8jLr6rKSVVIyy9SKEpMyUwEC6aWJGdk5qUrJBYUJBYllpQW8zCwpiXmFKfyQmluBnk31xBnD93Ugvz41OKCxOTUvNSSeGc_QzMTI2NzQ0djwioAgEUqHQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Suction nozzle for radiation etching apparatus</title><source>esp@cenet</source><creator>PEIJUAN YE ; YI ZHANG ; TONGSHENG ZHENG</creator><creatorcontrib>PEIJUAN YE ; YI ZHANG ; TONGSHENG ZHENG</creatorcontrib><description>The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam outlet and the debris channel is arranged independent of the radiation beam channel and has at least a debris suction inlet arranged near the radiation beam outlet.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050720&DB=EPODOC&CC=CN&NR=1642371A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050720&DB=EPODOC&CC=CN&NR=1642371A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PEIJUAN YE</creatorcontrib><creatorcontrib>YI ZHANG</creatorcontrib><creatorcontrib>TONGSHENG ZHENG</creatorcontrib><title>Suction nozzle for radiation etching apparatus</title><description>The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam outlet and the debris channel is arranged independent of the radiation beam channel and has at least a debris suction inlet arranged near the radiation beam outlet.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNALLk0uyczPU8jLr6rKSVVIyy9SKEpMyUwEC6aWJGdk5qUrJBYUJBYllpQW8zCwpiXmFKfyQmluBnk31xBnD93Ugvz41OKCxOTUvNSSeGc_QzMTI2NzQ0djwioAgEUqHQ</recordid><startdate>20050720</startdate><enddate>20050720</enddate><creator>PEIJUAN YE</creator><creator>YI ZHANG</creator><creator>TONGSHENG ZHENG</creator><scope>EVB</scope></search><sort><creationdate>20050720</creationdate><title>Suction nozzle for radiation etching apparatus</title><author>PEIJUAN YE ; YI ZHANG ; TONGSHENG ZHENG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN1642371A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>PEIJUAN YE</creatorcontrib><creatorcontrib>YI ZHANG</creatorcontrib><creatorcontrib>TONGSHENG ZHENG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PEIJUAN YE</au><au>YI ZHANG</au><au>TONGSHENG ZHENG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Suction nozzle for radiation etching apparatus</title><date>2005-07-20</date><risdate>2005</risdate><abstract>The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam outlet and the debris channel is arranged independent of the radiation beam channel and has at least a debris suction inlet arranged near the radiation beam outlet.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Suction nozzle for radiation etching apparatus |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T02%3A10%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PEIJUAN%20YE&rft.date=2005-07-20&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN1642371A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |