Suction nozzle for radiation etching apparatus

The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	PEIJUAN YE, YI ZHANG, TONGSHENG ZHENG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention relates to a suction nozzle for radiation etching device, applied in a radiation etching device making organic luminous panel, and including a radiation beam channel and at least a debris channel, where the radiation beam channel runs through the suction nozzle and has a radiation beam outlet and the debris channel is arranged independent of the radiation beam channel and has at least a debris suction inlet arranged near the radiation beam outlet.