Electrostatic discharge protection method and structure for photomask

This invention relates to integration circuit mask and its usage, which comprises the following parts: mask underlay; the active mask area on the first part of the underlay; the first protective ring structure to isolate the active area with the said mask underlay outer area; second protective ring...

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Bibliographische Detailangaben
1. Verfasser:	GUIQI GUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	This invention relates to integration circuit mask and its usage, which comprises the following parts: mask underlay; the active mask area on the first part of the underlay; the first protective ring structure to isolate the active area with the said mask underlay outer area; second protective ring structure with the melt wire structure covering on part of the first protective ring structure; the melt wire structure can be connected to the active area to absorb static current.