Surface treatment apparatus and method for manufacturing liquid crystal display device

A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a contact and separation with/from tip...

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Bibliographische Detailangaben
Hauptverfasser: KAWANAGO HIROSHI, TAKAHARA YOICHI, YAMADA MASAHIRO, TAKAHASHI TOMOAKI, ASAKA SHOJI, YAMAMOTO HIDEAKI, OHROKU NORIYUKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a contact and separation with/from tips of scrub materials of the brush being rotating, and controls a positioning of the brush by use of the measurement results. With the process as described above, it is possible to treat uniformly a surface to-be-cleaned for a large-sized substrate, with the cleaning brush. Consequently, it is possible to form a highly qualified transistor for liquid crystal display on the substrate having been cleaned, with enhancing yield.