Photoresist stripping liquid composition and stripping methof for photoresist using photoresist stripping liquid composition

PURPOSE: A photoresist stripping solution composition and a method for stripping a photoresist by using the composition are provided, to allow a modified or cured photoresist generated during a wet or dry etching process to be stripped easily at a low temperature for a short time without damaging ex...

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Bibliographische Detailangaben

Hauptverfasser:	SONG SUNYONG, KIM BYINGMUK, LEE HYOJIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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