Lithographic apparatus and device manufacturing method

The apparatus has a detector unit (16) arranged such that portions of a substrate (10) subsequently become target portions of the exposed substrate. The distance the substrate to be moved is known from the relative positions of the detector unit and a projection system. The detector unit inspects th...

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Bibliographische Detailangaben
Hauptverfasser:	GUI GHENG-QUN DGARGELL P.W.H, GEORGE RICHARD ALEXANDER
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The apparatus has a detector unit (16) arranged such that portions of a substrate (10) subsequently become target portions of the exposed substrate. The distance the substrate to be moved is known from the relative positions of the detector unit and a projection system. The detector unit inspects the alignment marks on a given portion of the substrate just before the exposure of the target portion of the substrate. An independent claim is also included for a device manufacturing method.