Magnetic recording element and method of manufacturing the same

为了减小TMR元件和与其连接的导体的位置配合公差，通过采用使用了用来在平面上的负X方向侧使TMR元件1和金属片5的侧面对齐的X方向边界掩膜S11的光刻技术，对TMR元件1和金属片5整形。X方向边界掩膜S11具有直线上的边界，该边界与Y方向平行，且配置成与TMR元件1和金属片5中任何一个在平面上交叉。而且，在正X方向侧利用该边界将TMR元件1和金属片5覆盖。 A photolithographic process using an X-direction delimiting mask (S 11 ) for aligning respective side faces of a TMR ele...

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1. Verfasser:	MAEJIMA SHINMUTSU,AGANO SHUICHI,NAGAEI TAKASHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER PHYSICS SEMICONDUCTOR DEVICES STATIC STORES
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Beschreibung
Zusammenfassung:	为了减小TMR元件和与其连接的导体的位置配合公差，通过采用使用了用来在平面上的负X方向侧使TMR元件1和金属片5的侧面对齐的X方向边界掩膜S11的光刻技术，对TMR元件1和金属片5整形。X方向边界掩膜S11具有直线上的边界，该边界与Y方向平行，且配置成与TMR元件1和金属片5中任何一个在平面上交叉。而且，在正X方向侧利用该边界将TMR元件1和金属片5覆盖。 A photolithographic process using an X-direction delimiting mask (S 11 ) for aligning respective side faces of a TMR element ( 1 ) and a strap ( 5 ) situated in a negative X side is performed, to shape the TMR element ( 1 ) and the strap ( 5 ) into desired configurations. The X-direction delimiting mask (S 11 ) includes a straight edge and is disposed such that the straight edge is parallel to a Y direction and crosses both the TMR element ( 1 ) and the strap ( 5 ) in plan view. In use of the X-direction delimiting mask (S 11 ), respective portions of the TMR element ( 1 ) and the strap ( 5 ) situated in a positive X side relative to the straight edge in plan view are covered with the X-direction delimiting mask (S 11 ).