Recessed sputter target

此方法制造了溅射靶组件(30)。其首先包括制造靶芯(10)的步骤。靶芯(10)具有屈服强度、直径、高度、平坦的顶面和圆锥状的底面(12)。接着制造背板(20)。背板(20)具有与靶芯(10)直径一致的圆柱形凹槽(22)。圆柱形凹槽(22)的深度小于靶芯(10)的高度,其屈服强度也小于靶芯(10)的屈服强度。最后,将靶芯(10)压入背板(20)的圆柱形凹槽(22),以将靶芯(10)结合到背板(20)上,从而形成靶组件(30)。压制的靶组件(30)包括带有圆锥形底面(12)的靶芯(10)。 The method manufactures sputter target assemblies. It...

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Bibliographische Detailangaben
Hauptverfasser: H.J. KOENIGSMANN, P.S. GILMAN, T.J. HUNT
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:此方法制造了溅射靶组件(30)。其首先包括制造靶芯(10)的步骤。靶芯(10)具有屈服强度、直径、高度、平坦的顶面和圆锥状的底面(12)。接着制造背板(20)。背板(20)具有与靶芯(10)直径一致的圆柱形凹槽(22)。圆柱形凹槽(22)的深度小于靶芯(10)的高度,其屈服强度也小于靶芯(10)的屈服强度。最后,将靶芯(10)压入背板(20)的圆柱形凹槽(22),以将靶芯(10)结合到背板(20)上,从而形成靶组件(30)。压制的靶组件(30)包括带有圆锥形底面(12)的靶芯(10)。 The method manufactures sputter target assemblies. It first includes the step of manufacturing a target insert. The target insert has a yield strength, a diameter, a height, a planar top surface and a conical-shaped rear surface. Then a backing plate is manufactured. The backing plate has a cylindrical recess that corresponds to the diameter of the target insert. The cylindrical recess has a depth less than the height of the target insert and a yield strength less than the yield strength of the target insert. Finally, pressing the target insert into the cylindrical recess of the backing plate bonds the target insert to the backing plate to form a target assembly. The pressed target assembly contains the target insert with the conical-shaped rear surface.