Structure for preventing mosaic copper metal damage and method thereof

The invention relates to a method for preventing the damage of the mosaic copper which comprises, providing a substrate, the top layer of which is an insulation layer, at least one opening is arranged on the insulation layer, forming a first barrier layer on the insulation layer, forming a sheet copper layer on the first barrier layer, using the surface of the first barrier layer as an end point,proceeding a chemical-mechanical abrasion process to make the copper layer even, carrying out a selective etching process on the even copper layer. The invention can prevent the oxidization phenomenon caused by the direct exposition of the copper in the humid air or by the contacting of acidic gases. 本发明涉及一种防止镶嵌式铜金属受损的方法，包括下列步骤：提供一基底，该基底顶层为一绝缘层，在该绝缘层上具有至少一开口，在该绝缘层上顺应性形成一第一阻障层，在该第一阻障层上全面性形成一铜金属层，以该第一阻障层表面为终点，进行一化学机械研磨制程，以平坦化该铜金属层，实施一选择性蚀刻制程在该平坦化的铜金属层，使该铜金属层表面相对低于该绝缘层表面，在该开口内形成一第二阻障层，使该铜金属层完全密封在该第一阻障层和该第二阻障层之内；本发明将铜金属完全密封于阻障层之内，可避免铜金属直接暴露在潮湿空气中或是因接触酸性气体而产生的氧化现象，且亦可用于防制因退火制程后，铜金属在引洞中的凸起现象。