Mfg. equipment
本发明提供一种蒸发设备和蒸发方法,该蒸发设备是一种膜形成装置,并提供EL层膜厚的优异均匀性、优异生产率和EL材料的提高的利用效率。本发明的特征在于在蒸发期间其中设置封闭蒸发材料的容器的蒸发源固定器可以一定间距相对于衬底移动。此外,膜厚监视器与蒸发源固定器结合在一起,用于移动。此外,通过根据由膜厚监视器检测的值调整蒸发源固定器的移动速度,可以使膜厚均匀。 The present invention provides an evaporation apparatus, which is one type of film formation apparatus and provides superi...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | 本发明提供一种蒸发设备和蒸发方法,该蒸发设备是一种膜形成装置,并提供EL层膜厚的优异均匀性、优异生产率和EL材料的提高的利用效率。本发明的特征在于在蒸发期间其中设置封闭蒸发材料的容器的蒸发源固定器可以一定间距相对于衬底移动。此外,膜厚监视器与蒸发源固定器结合在一起,用于移动。此外,通过根据由膜厚监视器检测的值调整蒸发源固定器的移动速度,可以使膜厚均匀。
The present invention provides an evaporation apparatus, which is one type of film formation apparatus and provides superior uniformity in EL layer film thickness, superior throughput, and improved utilization efficiency of EL materials and an evaporation method. The present invention is characterized in that an evaporation source holder, in which a container that encloses an evaporation material is disposed, is moved at a certain pitch with respect to a substrate during evaporation. Further, a film thickness monitor is integrated with the evaporation source holder for the movement. Furthermore, film thickness can be made uniform by adjusting the moving speed of the evaporation source holder in accordance with values measured by the film thickness monitor. |
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