Cerium-based polishing material slurry and mehtod for manufacturing the same

本发明是含有全稀土类氧化物(TREO)占95重量％以上的铈类研磨材料粒子的铈类研磨材料浆剂。上述铈类研磨材料粒子中，对应于TREO的氟含量不到3重量％，利用激光衍射法测得的粒径分布在规定范围内。另外，将对应于TREO的氟含量定为0.005-0.5重量％可改善附着性。 The present invention provides a cerium-based abrasive slurry particles including a cerium-based abrasive particle of no less than 95% by weight of total rare earth o...

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Bibliographische Detailangaben
Hauptverfasser:	USHIYAMA KAZUYA, UCHINO YOSHIJI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS DRESSING OR CONDITIONING OF ABRADING SURFACES DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OFSOLID INORGANIC COMPOUNDS INORGANIC CHEMISTRY MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES TRANSPORTING
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Beschreibung
Zusammenfassung:	本发明是含有全稀土类氧化物(TREO)占95重量％以上的铈类研磨材料粒子的铈类研磨材料浆剂。上述铈类研磨材料粒子中，对应于TREO的氟含量不到3重量％，利用激光衍射法测得的粒径分布在规定范围内。另外，将对应于TREO的氟含量定为0.005-0.5重量％可改善附着性。 The present invention provides a cerium-based abrasive slurry particles including a cerium-based abrasive particle of no less than 95% by weight of total rare earth oxides (TREO) , in which the cerium-based abrasive particle has less than 3% by weight of fluorine content of TREO, and a particle size distribution determined by a laser diffraction method is within a predetermined range. And adhesion property is further improved by setting this fluorine content in 0.005 to 0.5% by weight of TREO.