Method of measuring built crystal layer thickness
A method for measuring the thickness of an epitaxial layer on substrate includes such steps as generating a non-monocrystal layer on substrate, generating an epitaxial layer to be measured to become polycrystal on the non-monocrystal layer, measuring the thicknesses of polycrystal layer and non-crys...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method for measuring the thickness of an epitaxial layer on substrate includes such steps as generating a non-monocrystal layer on substrate, generating an epitaxial layer to be measured to become polycrystal on the non-monocrystal layer, measuring the thicknesses of polycrystal layer and non-crystal layer and the difference between their thickness sum and said epitaxial layer to be measured, and subtracting. |
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