Method of producing polysilicon with mixed source of trichloro-hydrosilicon and silicon tetrachloride

The present invention, method of producing polysilicon with mixed source of trichloro-hydro silicon and silicon tetrachloride, is one completely new hydrogen reduction process of producing polysilicon. The trichloro-hydro silicon and silicon tetrachloride is first refined and purified to 9-10 nines under protective dry inert gas of 0.5-0.8 atm and the hydrogen is also refined to 5-6 nines. The material is then sprayed into hydrogen reduction furance is certain flow rate to result in silicon converting rate of 0.08% and H/Cl ratio of 0.15% of the reduction temperature is controlled in 1145-1155 deg.c, so that polysilicon is produced on the silicon rod inside the furnace. SiC14 and HCl produced in the production process is utilized fully and this results in high quality, high yield, low material consumption and low cost.