Manufacturing method for lithographic apparatus and device and device made therefrom

A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (2) for holding a subst...

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Bibliographische Detailangaben
1. Verfasser:	OTTENS JOOST J.,ZAAL KOEN J. J. M.,MIEDEMA JAN REIN,VAN EMPEL TJARKO A. R.,VAN MEER ASCHWIN L. H. J
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (2) for holding a substrate (1) said substrate holder (2) provided with means to provide a holding force for pressing the substrate against the substrate holder; releasing means (4) for ejecting said substrate (1) from said holder (2) against said holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. According to the invention, the lithographic projection apparatus comprises a controller (5) for controlling said releasing means (4) so as to release said substrate (1) from said holder (2) with a release force that is reduced preceding to final release.